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LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
설명
SPEC SP3510PC
환경 설정
SW Ver: WIN XP & IDX (PC TYPE) mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: HATM5.0
OEM 모델 설명
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
문서

문서 없음

카테고리
Ashers / Plasma Cleaner

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

98802


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기

LAM RESEARCH / NOVELLUS / GASONICS

L3510

verified-listing-icon
검증됨
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/cdf0478b7ff14679995b2213875fbe9e_sp3510pc10_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/1f1782fd8b2049119d1040d04eed58d1_sp3510pc4_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/ef80b8fa9bd54f5795a79ef1b578c77f_sp3510pc1_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/4a9766331ca949ffab26deabf38bfa05_sp3510pc2_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/251b3d1505cf45f5a5acfa3962fa6eab_sp3510pc5_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/aa685c58dbcc4de6b82f159dc57b8da7_sp3510pc12_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/eac0c475a85a4bad9152ee9f402e111f_sp3510pc7_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/0f44087283c94c5fb95a0dab76496ccb_sp3510pc8_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/618dd885a8dd401a9d0673897914ef6c_sp3510pc9_mw.jpg
listing-photo-7ba66d1b625549d6a02231842540c9db-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/7ba66d1b625549d6a02231842540c9db/3790d4f009eb4a7e8f9d3c96cfbd7258_sp3510pc11_mw.jpg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

98802


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
SPEC SP3510PC
환경 설정
SW Ver: WIN XP & IDX (PC TYPE) mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: HATM5.0
OEM 모델 설명
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
문서

문서 없음

유사 등재물
모두 보기