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GASONIC L3510 Single Wafer Downstream Photoresist Asher환경 설정
8” configured (can change to 6”) Quartz Plasma Tube and Baffles ASTEX Microwave 1.2kw Temperature Controlled Wafer Cooled Aluminum Process Chamber Robotic Pick and Place Wafer Handler ( KORO ) Fixed Position Single Cassette Station Downstream End Point Detection SEMI SECS ⅱ Software 2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm System Power : 208 VAC , 60 A, 3 Phase, 50/60HzOEM 모델 설명
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.문서
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
82160
웨이퍼 사이즈:
8"/200mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
LAM RESEARCH / NOVELLUS / GASONICS
L3510
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
82160
웨이퍼 사이즈:
8"/200mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available