설명
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 3D, 1WEE, 11LHP, 4CPL, 1CPL-t, 1TRS, 2TRS-L Mainframe: Single Block LD: 3ea, no modification환경 설정
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 2D, 1WEE, 3LHP, 2PCH, 2CPL, 3TRS Mainframe : Single Block LD: 2ea modified to AsystOEM 모델 설명
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.문서
문서 없음
TEL / TOKYO ELECTRON
ACT 8
검증됨
카테고리
Coaters & Developers
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105233
웨이퍼 사이즈:
8"/200mm
빈티지:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
ACT 8
카테고리
Coaters & Developers
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105233
웨이퍼 사이즈:
8"/200mm
빈티지:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 3D, 1WEE, 11LHP, 4CPL, 1CPL-t, 1TRS, 2TRS-L Mainframe: Single Block LD: 3ea, no modification환경 설정
2 Develop, WEE, 3 Low temp hot plate, 2 chill plates, 2 precision chill hot plates Right, 2D, 1WEE, 3LHP, 2PCH, 2CPL, 3TRS Mainframe : Single Block LD: 2ea modified to AsystOEM 모델 설명
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.문서
문서 없음