설명
Multi Block (Resist Coater/Developer)환경 설정
환경 설정 없음OEM 모델 설명
CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.문서
문서 없음
카테고리
Coaters & Developers
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147809
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
LITHIUS Pro AP
카테고리
Coaters & Developers
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147809
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Multi Block (Resist Coater/Developer)환경 설정
환경 설정 없음OEM 모델 설명
CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.문서
문서 없음