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TEL / TOKYO ELECTRON LITHIUS Pro
    설명
    Multi Block (Resist Coater/Developer)
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The CLEAN TRACK™ LITHIUS Pro™ is a state-of-the-art 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through its innovative modules and integrated metrology, providing advanced process control solutions. Additionally, this platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership), making it a cost-effective and efficient solution for your lithography needs.
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    카테고리
    Coaters & Developers

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    119633


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    TEL / TOKYO ELECTRON

    LITHIUS Pro

    verified-listing-icon
    검증됨
    카테고리
    Coaters & Developers
    마지막 검증일: 60일 이상 전
    listing-photo-07f87b0fbe8c4fcab2241bea7e5a7c37-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    119633


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Multi Block (Resist Coater/Developer)
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The CLEAN TRACK™ LITHIUS Pro™ is a state-of-the-art 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through its innovative modules and integrated metrology, providing advanced process control solutions. Additionally, this platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership), making it a cost-effective and efficient solution for your lithography needs.
    문서

    문서 없음