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TEL / TOKYO ELECTRON MARK II
    설명
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    환경 설정
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    OEM 모델 설명
    The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.
    문서

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    카테고리
    Coaters & Developers

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    43000


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
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    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    TEL / TOKYO ELECTRON

    MARK II

    verified-listing-icon
    검증됨
    카테고리
    Coaters & Developers
    마지막 검증일: 60일 이상 전
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    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    43000


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.
    문서

    문서 없음

    유사 등재물
    모두 보기