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APPLIED MATERIALS (AMAT) P5000 CVD
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    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    검증됨

    카테고리
    CVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    29764


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    빈티지: 1994조건: 중고
    마지막 검증일오늘

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    검증됨
    카테고리
    CVD
    마지막 검증일: 60일 이상 전
    listing-photo-7aad2fd5883943609bfb9de7aa97d869-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1273/7aad2fd5883943609bfb9de7aa97d869/71a7d3ad01ba4404a867a150b765e3c1_1d776be7e6034a1d998b594f64a06c20_f.jpeg
    listing-photo-7aad2fd5883943609bfb9de7aa97d869-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1273/7aad2fd5883943609bfb9de7aa97d869/1bb32246b7ea475885e2a1885b988856_433a03be788e42bc8175b290fc751b421201a_f.jpeg
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    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    29764


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD빈티지: 1994조건: 중고마지막 검증일:오늘
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD빈티지: 1995조건: 중고마지막 검증일:16일 전
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD빈티지: 0조건: 중고마지막 검증일:60일 이상 전