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APPLIED MATERIALS (AMAT) P5000 CVD
    설명
    설명 없음
    환경 설정
    PECVD System, 2-Chamber, (2) DXE,
    OEM 모델 설명
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    문서

    문서 없음

    카테고리
    CVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    120015


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    검증됨
    카테고리
    CVD
    마지막 검증일: 60일 이상 전
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/d3ea546066b44f3ba3c1abf267c63d11_f8e63be8747c46fa96eff6a19ebb61d145005c_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/64e57ee70ef2417d9da4e8e2dd064a63_3c536548da0d43db861541ecbbfbbfe9_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/7391b86e2b9e4fcf8dcdbeda36093784_a368a0a9a32245339e1cb5c110e0d6d3_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/2fbe87d0bf3a4c1ca305c5a6cd594f25_cfaf8d54e85f4837b00d090d187428f0_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/85d5508b97fd43d7a63a4f34ef19c496_985f1d4e3b794dc7befe4b67aeb59284_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/3131ac85abf647df9e6154ce30903c8e_fb3caadab36243539a257d609fcab158_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/ceb2f8e621924ea9a49e3486fd142a57_8a913387849a43a6b0ef5736f81e12971201a_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/669863c50e734a03b30666179ecd13c3_46a01d56852f4bddbcfb5c70ae02803d_mw.jpeg
    listing-photo-84e06bd04c0b49829789435c89e68114-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/54272/84e06bd04c0b49829789435c89e68114/505c2d3f6d7c465e91b3ad4aca8db8bb_2e6425ce69a640b8ab4da1f59b1a4de4_mw.jpeg
    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    120015


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    PECVD System, 2-Chamber, (2) DXE,
    OEM 모델 설명
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    문서

    문서 없음

    유사 등재물
    모두 보기