설명
Hardware Configuration : - 3 Dep. PLIS (Precision Liquid Injection System) Chamber - 1 Sputter Etch Chamber - Parts and Modules : (1) 1-Delatech Scrubber Model 859(non-recirc) (2) 1-Main power box w/4 ENI RF Generators (3) 1-Delta RF generator rack w/3 RFPP generators (4) 1-AMAT '0' Heat exchanger (5) 1-Front monitor (6) 1-Rear monitor (7) 3-50x20 Ebara pumps (Refurbished) (8) 2-40x20 Ebara pumps (Refurbished) (9) 1-Mini controller환경 설정
SiO2 CVD (including dry pumps (5 Ea.), Scrubber, etc.)OEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음
APPLIED MATERIALS (AMAT)
P5000 CVD
검증됨
카테고리
CVD
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
51182
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기APPLIED MATERIALS (AMAT)
P5000 CVD
검증됨
카테고리
CVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
51182
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Hardware Configuration : - 3 Dep. PLIS (Precision Liquid Injection System) Chamber - 1 Sputter Etch Chamber - Parts and Modules : (1) 1-Delatech Scrubber Model 859(non-recirc) (2) 1-Main power box w/4 ENI RF Generators (3) 1-Delta RF generator rack w/3 RFPP generators (4) 1-AMAT '0' Heat exchanger (5) 1-Front monitor (6) 1-Rear monitor (7) 3-50x20 Ebara pumps (Refurbished) (8) 2-40x20 Ebara pumps (Refurbished) (9) 1-Mini controller환경 설정
SiO2 CVD (including dry pumps (5 Ea.), Scrubber, etc.)OEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.문서
문서 없음