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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS
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    환경 설정
    WCVD
    OEM 모델 설명
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    문서

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    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

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    검증됨

    카테고리
    CVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    107438


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    CVD
    빈티지: 0조건: 중고
    마지막 검증일11일 전

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon
    검증됨
    카테고리
    CVD
    마지막 검증일: 60일 이상 전
    listing-photo-a93458886a654a6588d39bd2a366fb08-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    107438


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    WCVD
    OEM 모델 설명
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    CVD빈티지: 0조건: 중고마지막 검증일:11일 전
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    CVD빈티지: 0조건: 중고마지막 검증일:17일 전
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    CVD빈티지: 2009조건: 중고마지막 검증일:30일 이상 전