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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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KLA CANDELA CS20
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    문서

    문서 없음

    KLA

    CANDELA CS20

    verified-listing-icon

    검증됨

    카테고리
    Defect Inspection

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    85052


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection
    빈티지: 2006조건: 중고
    마지막 검증일30일 이상 전

    KLA

    CANDELA CS20

    verified-listing-icon
    검증됨
    카테고리
    Defect Inspection
    마지막 검증일: 60일 이상 전
    listing-photo-37affdd90b204b51ac7340f14665a833-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    85052


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection빈티지: 2006조건: 중고마지막 검증일:30일 이상 전
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection빈티지: 2006조건: 중고마지막 검증일:30일 이상 전
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection빈티지: 2006조건: 중고마지막 검증일:60일 이상 전