설명
Darkfield inspection환경 설정
-Software Version: Windows -CIM: Yes -Process: Wafer scanning -Main System TESTER SIDE (1) -Handler System WAFER HANDLER SYSTEM (1) -Factory Interface FOUP (2) -Auxillary Rack (1)OEM 모델 설명
The AIT XUV is KLA-Tencor’s next-generation double-darkfield optical inspection tool. It offers higher throughput and sensitivity for 65-nm production requirements, with a wide range of spot sizes and advanced detection algorithms. It also features an auto-positioning system, autofocus unit, and iADC capability for faster results. It is field upgradeable from the AIT UV platform and provides detection capability for current-layer defects at speeds up to three times faster than the prior-generation AIT XP system, with improved focus, tracking performance, and die-to-die registration.문서
문서 없음
KLA
AIT XUV
검증됨
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113031
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
AIT XUV
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113031
웨이퍼 사이즈:
12"/300mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Darkfield inspection환경 설정
-Software Version: Windows -CIM: Yes -Process: Wafer scanning -Main System TESTER SIDE (1) -Handler System WAFER HANDLER SYSTEM (1) -Factory Interface FOUP (2) -Auxillary Rack (1)OEM 모델 설명
The AIT XUV is KLA-Tencor’s next-generation double-darkfield optical inspection tool. It offers higher throughput and sensitivity for 65-nm production requirements, with a wide range of spot sizes and advanced detection algorithms. It also features an auto-positioning system, autofocus unit, and iADC capability for faster results. It is field upgradeable from the AIT UV platform and provides detection capability for current-layer defects at speeds up to three times faster than the prior-generation AIT XP system, with improved focus, tracking performance, and die-to-die registration.문서
문서 없음