설명
CVD system환경 설정
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 모델 설명
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.문서
문서 없음
카테고리
Deposition
마지막 검증일: 5일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
154819
웨이퍼 사이즈:
12"/300mm
빈티지:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIASe+ Ti/TiN
카테고리
Deposition
마지막 검증일: 5일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
154819
웨이퍼 사이즈:
12"/300mm
빈티지:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
CVD system환경 설정
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 모델 설명
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.문서
문서 없음