설명
ETCH환경 설정
3CHOEM 모델 설명
The TEL (Tokyo Electron) Trias SPA is a single-wafer plasma processing system designed for semiconductor manufacturing. It utilizes Tokyo Electron's Slot Plane Antenna (SPA) technology to generate high-density, low-electron-temperature plasma, enabling low-damage, low-temperature plasma treatments. This system is particularly suited for critical front-end-of-line (FEOL) applications, including gate nitridation, gate recovery oxidation, and shallow trench isolation (STI) liner oxidation.문서
문서 없음
카테고리
Deposition
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75752
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
TRIAS SPA
카테고리
Deposition
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75752
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ETCH환경 설정
3CHOEM 모델 설명
The TEL (Tokyo Electron) Trias SPA is a single-wafer plasma processing system designed for semiconductor manufacturing. It utilizes Tokyo Electron's Slot Plane Antenna (SPA) technology to generate high-density, low-electron-temperature plasma, enabling low-damage, low-temperature plasma treatments. This system is particularly suited for critical front-end-of-line (FEOL) applications, including gate nitridation, gate recovery oxidation, and shallow trench isolation (STI) liner oxidation.문서
문서 없음