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APPLIED MATERIALS (AMAT) CENTURA
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    설명 없음
    환경 설정
    DXZ
    OEM 모델 설명
    The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.
    문서

    문서 없음

    APPLIED MATERIALS (AMAT)

    CENTURA

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    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 어제

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    117099


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etch
    빈티지: 2007조건: 중고
    마지막 검증일60일 이상 전

    APPLIED MATERIALS (AMAT)

    CENTURA

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 어제
    listing-photo-88b551eab3f64903bf349964842668c7-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    117099


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    DXZ
    OEM 모델 설명
    The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etch빈티지: 2007조건: 중고마지막 검증일:60일 이상 전
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etch빈티지: 2000조건: 중고마지막 검증일:60일 이상 전
    APPLIED MATERIALS (AMAT) CENTURA

    APPLIED MATERIALS (AMAT)

    CENTURA

    Dry / Plasma Etch빈티지: 1997조건: 중고마지막 검증일:60일 이상 전