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LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
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    The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
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    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    131353


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2011


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO45

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO45

    Dry / Plasma Etch
    빈티지: 0조건: 부품 도구
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO45

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-7b831b39c83a4d27912736fcde435210-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    131353


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2011


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    E4 Frame
    OEM 모델 설명
    The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO45

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO45

    Dry / Plasma Etch빈티지: 0조건: 부품 도구마지막 검증일:60일 이상 전
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO45

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO45

    Dry / Plasma Etch빈티지: 2011조건: 중고마지막 검증일:30일 이상 전
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO45

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO45

    Dry / Plasma Etch빈티지: 2011조건: 중고마지막 검증일:60일 이상 전