설명
설명 없음환경 설정
AL-ETC2 Missing Parts: Model- CENTURA, Part Name-UPS, Model no- DPWR35611, Quantity- 1OEM 모델 설명
TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
127217
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
LAM RESEARCH CORPORATION
TCP 9600
카테고리
Dry / Plasma Etch
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
127217
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
AL-ETC2 Missing Parts: Model- CENTURA, Part Name-UPS, Model no- DPWR35611, Quantity- 1OEM 모델 설명
TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.문서
문서 없음