설명
System hand: Left hand for 200mm, Right hand for 150mm available, Maint Console: Mini Maint CPU: 68040 Software Ver: 7.65 RP/ATM:RP Vacuum load lock: Ask RP Orientation: Bottom feed Gas Panel orientation: Top Feed TCS Mini Bubbler: 10L LPE Gas Detection: Gastec H2/HCL Temp Controller: Foxboro환경 설정
환경 설정 없음OEM 모델 설명
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.문서
문서 없음
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
139576
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ASM
EPSILON E2000
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
139576
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
System hand: Left hand for 200mm, Right hand for 150mm available, Maint Console: Mini Maint CPU: 68040 Software Ver: 7.65 RP/ATM:RP Vacuum load lock: Ask RP Orientation: Bottom feed Gas Panel orientation: Top Feed TCS Mini Bubbler: 10L LPE Gas Detection: Gastec H2/HCL Temp Controller: Foxboro환경 설정
환경 설정 없음OEM 모델 설명
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.문서
문서 없음