설명
ASM Epsilon 2000 EPI Complete with HDD and Software included.환경 설정
Upgraded from E2 to E2000. Has TCS with ASM LVC, integrated LPE bubbler Atmospheric system, N-type / P-type doping.OEM 모델 설명
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.문서
문서 없음
PREFERRED
SELLER
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 60일 이상 전
Buyer pays 12% premium of final sale price
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
112717
웨이퍼 사이즈:
6"/150mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PREFERRED
SELLER
ASM
EPSILON E2000
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 60일 이상 전
Buyer pays 12% premium of final sale price
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
112717
웨이퍼 사이즈:
6"/150mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ASM Epsilon 2000 EPI Complete with HDD and Software included.환경 설정
Upgraded from E2 to E2000. Has TCS with ASM LVC, integrated LPE bubbler Atmospheric system, N-type / P-type doping.OEM 모델 설명
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.문서
문서 없음