설명
설명 없음환경 설정
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEM 모델 설명
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.문서
문서 없음
APPLIED MATERIALS (AMAT)
P5000 ETCH
검증됨
카테고리
Etch/Asher
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
Deinstalled
제품 ID:
113063
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기APPLIED MATERIALS (AMAT)
P5000 ETCH
카테고리
Etch/Asher
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
Deinstalled
제품 ID:
113063
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEM 모델 설명
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.문서
문서 없음