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LAM RESEARCH CORPORATION 2300 EXELAN
    설명
    4 chamber
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
    문서

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    LAM RESEARCH CORPORATION

    2300 EXELAN

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    검증됨

    카테고리
    Etch/Asher

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    32126


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/Asher
    빈티지: 0조건: 개조됨
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    2300 EXELAN

    verified-listing-icon
    검증됨
    카테고리
    Etch/Asher
    마지막 검증일: 60일 이상 전
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    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    32126


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    4 chamber
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/Asher빈티지: 0조건: 개조됨마지막 검증일: 60일 이상 전
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/Asher빈티지: 0조건: 중고마지막 검증일: 6일 전
    LAM RESEARCH CORPORATION 2300 EXELAN

    LAM RESEARCH CORPORATION

    2300 EXELAN

    Etch/Asher빈티지: 0조건: 중고마지막 검증일: 6일 전