설명
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: PYRO Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: PN2 / H2 / O2환경 설정
Process: PYRO The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 모델 설명
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.문서
문서 없음
KOKUSAI-ELECTRIC (KE)
DD-802V
검증됨
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72845
웨이퍼 사이즈:
6"/150mm
빈티지:
1990
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
KOKUSAI-ELECTRIC (KE)
DD-802V
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72845
웨이퍼 사이즈:
6"/150mm
빈티지:
1990
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: PYRO Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: PN2 / H2 / O2환경 설정
Process: PYRO The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 모델 설명
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.문서
문서 없음