We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: POLY-Si Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: N2 / SiH4환경 설정
Process: POLY-Si The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 모델 설명
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.문서
문서 없음
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72846
웨이퍼 사이즈:
6"/150mm
빈티지:
1992
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
KOKUSAI-ELECTRIC (KE)
DD-802V
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
72846
웨이퍼 사이즈:
6"/150mm
빈티지:
1992
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: POLY-Si Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: N2 / SiH4환경 설정
Process: POLY-Si The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 모델 설명
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.문서
문서 없음