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TEL / TOKYO ELECTRON ALPHA-8SE
    설명
    D-POLY
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    문서
    verified-listing-icon

    검증됨

    카테고리
    Furnaces / Diffusion

    마지막 검증일: 17일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    138030


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    빈티지: 2006조건: 중고
    마지막 검증일17일 전

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    검증됨
    카테고리
    Furnaces / Diffusion
    마지막 검증일: 17일 전
    listing-photo-7fe024218d6b484b980ffe32dae800de-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1515/7fe024218d6b484b980ffe32dae800de/25c7004eb891490b9f32cb7fcc2776b4_1_mw.png
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    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    138030


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    D-POLY
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    문서
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 2006조건: 중고마지막 검증일:17일 전
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 2003조건: 중고마지막 검증일:25일 전
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 2004조건: 중고마지막 검증일:17일 전