설명
HI TEMP OXIDE Details Attached System Layout: Main, Utility System Type: L Type Side Maintenance: Installed System Paint Color: Ivory Furnace Front Surface Finish: Ivory Heater Model: VMU-40-007EX(1200°C) Rapid Cooling Unit: Not Installed N2 Load Lock: Not Installed O2 Analyzer: Not Installed Cassette I/O Type: Normal I/O Type (NOT SMIF) SMIF Maker/Model: Not Installed AGV Compatibility: Unable System Main Controller: WAVES Mechanical Controller: WAVES Sequenc Controller: WAVES Gas Controller: WAVES Gas Flow Chart Panel: Installed (Front, Rear) Operation Panel: Installed (Front, Rear) Signal Tower / Colors: Installed (3 COLORS) Furnace Temperature Controller: Model 560A Furnace Overtemp Detector: FENWAL/DMR-5FR Gas Detector Maker / Model: GD-K7D-4 Detecting Gas: H2, N2O Host Communications: Yes User Host Computer I/F: SECS환경 설정
Gas System - Process Gas: N2, O2, H2, N2O Basic Style: Integrated Gas System (Fujikin) Manual Valve: NUPRO Air-Operated Valve: FUJIKIN Filter: MILLIPORE Regulator: VERIFLO MFC Maker/Model: STEC (7330, 7340, 7350) PT Sensor Maker / Model: NAGANO KEIKI (ZT15-220) DPM Maker / Model: NAGANO KEIKI Check Valve: NUPRO Baking System: N/A Liquid Source Auto-Refill: N/A Burn Controller: HEC PYRO CTL Vaporizer: N/A Vacuum / Exhaust System - Pump: N/A Pressure Control Valve: N/A Pressure Controller: N/A Pressure Sensor: N/A Trap: Not Installed Gas Cooler: N/A Wafer / Cassette Handling - Wafer Type: 150 mm Notch Type Auto Wafer Aligner: Installed Wafer Qty, in Cassette: 26 Cassette Storage Qty.: 21 Fork Type: 1+4 Fork-Wafer Presence Sensor: Installed Fork-Variable Pitch: Installed Magnetic Seal Rotation: Not InstalledOEM 모델 설명
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.문서
카테고리
Furnaces / Diffusion
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
139685
웨이퍼 사이즈:
6"/150mm
빈티지:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
ALPHA-8SE
카테고리
Furnaces / Diffusion
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
139685
웨이퍼 사이즈:
6"/150mm
빈티지:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available