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TEL / TOKYO ELECTRON ALPHA-8SE
    설명
    The unit is fully functional and has PAC to prevent cracking.
    환경 설정
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEM 모델 설명
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    문서

    문서 없음

    TEL / TOKYO ELECTRON

    ALPHA-8SE

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    검증됨

    카테고리
    Furnaces / Diffusion

    마지막 검증일: 18일 전

    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    103893


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
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    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    빈티지: 2003조건: 중고
    마지막 검증일24일 전

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    검증됨
    카테고리
    Furnaces / Diffusion
    마지막 검증일: 18일 전
    listing-photo-ea9f9ccac6684a4a90965f145a5fc3f0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/77608/ea9f9ccac6684a4a90965f145a5fc3f0/d497add6e11f4c718778743df7b04539_08a1493132f44956b793b614bb8b66fd_mw.jpeg
    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    103893


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    The unit is fully functional and has PAC to prevent cracking.
    환경 설정
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEM 모델 설명
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    문서

    문서 없음

    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 2003조건: 중고마지막 검증일: 24일 전
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 2003조건: 중고마지막 검증일: 30일 이상 전
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion빈티지: 0조건: 개조됨마지막 검증일: 18일 전