설명
Tokyo Electron Ltd. (TEL) TELINDY ALDOX Vertical Furnace환경 설정
환경 설정 없음OEM 모델 설명
The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.문서
문서 없음
TEL / TOKYO ELECTRON
TELINDY
검증됨
카테고리
Furnaces / Diffusion
마지막 검증일: 10일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113860
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기TEL / TOKYO ELECTRON
TELINDY
카테고리
Furnaces / Diffusion
마지막 검증일: 10일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113860
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Tokyo Electron Ltd. (TEL) TELINDY ALDOX Vertical Furnace환경 설정
환경 설정 없음OEM 모델 설명
The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.문서
문서 없음