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TEL / TOKYO ELECTRON TELINDY
    설명
    INDY B-L
    환경 설정
    Details Attached Poly 3 Process Diff (DPOLY) Furnace Main Body Unit Name - W × D x H Furnace section - 1100 X 3825 X 3631.5 Gas Box - 235 X 800 X 3086.5 Power Box - 1100 X 1100 X 2000 Safety Specification - SEMI S2-0703 / CE Heater Model - Mid-Temp, VMM-56-002 5zone / 500-1000℃ LATEST VERSION - LP Maximum Operation Temperature (℃) - 450℃ ART Control - None N2 Load Lock - Yes Wafer Type - 300mm-SI SEMI STD-Notch Qty of Production Wafers - 100 Boat Operation (Handling Position) - 1 Boat Type (B/E) Software Version (WAVES) - Latest Version A-1-4. Cooling water piping A-1-5. Process Vacuum Line A-1-6. Base plate A-1-7. Fan Filter unit (FFU) A-2-1. Carrier I/O port A-2-2. Boat elevator A-2-3. Auto shutter A-2-4. Buffer stage : 16 ea A-2-5. Wafer counter : 2 ea
    OEM 모델 설명
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    문서
    verified-listing-icon

    검증됨

    카테고리
    Furnaces / Diffusion

    마지막 검증일: 30일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Deinstalled


    제품 ID:

    129316


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    빈티지: 0조건: 중고
    마지막 검증일30일 이상 전

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    검증됨
    카테고리
    Furnaces / Diffusion
    마지막 검증일: 30일 이상 전
    listing-photo-579f653f16c2411d8d8e234d1ce62f90-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73363/579f653f16c2411d8d8e234d1ce62f90/a55b38acbb2a4c388a0d64d927a576ee_telindypage7image0001_mw.jpg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Deinstalled


    제품 ID:

    129316


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    INDY B-L
    환경 설정
    Details Attached Poly 3 Process Diff (DPOLY) Furnace Main Body Unit Name - W × D x H Furnace section - 1100 X 3825 X 3631.5 Gas Box - 235 X 800 X 3086.5 Power Box - 1100 X 1100 X 2000 Safety Specification - SEMI S2-0703 / CE Heater Model - Mid-Temp, VMM-56-002 5zone / 500-1000℃ LATEST VERSION - LP Maximum Operation Temperature (℃) - 450℃ ART Control - None N2 Load Lock - Yes Wafer Type - 300mm-SI SEMI STD-Notch Qty of Production Wafers - 100 Boat Operation (Handling Position) - 1 Boat Type (B/E) Software Version (WAVES) - Latest Version A-1-4. Cooling water piping A-1-5. Process Vacuum Line A-1-6. Base plate A-1-7. Fan Filter unit (FFU) A-2-1. Carrier I/O port A-2-2. Boat elevator A-2-3. Auto shutter A-2-4. Buffer stage : 16 ea A-2-5. Wafer counter : 2 ea
    OEM 모델 설명
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    문서
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion빈티지: 0조건: 중고마지막 검증일:30일 이상 전
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion빈티지: 0조건: 중고마지막 검증일:30일 이상 전
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion빈티지: 2009조건: 중고마지막 검증일:60일 이상 전