설명
SINGLE WAFER HIGH CURRENT IMPLANTER환경 설정
환경 설정 없음OEM 모델 설명
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.문서
문서 없음
APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
검증됨
카테고리
High Current
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111597
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
카테고리
High Current
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111597
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
SINGLE WAFER HIGH CURRENT IMPLANTER환경 설정
환경 설정 없음OEM 모델 설명
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.문서
문서 없음