메인 콘텐츠로 건너뛰기
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
HITACHI HL-7000M
    설명
    E-Beam Litho
    환경 설정
    6" RETICLE MASK LINE
    OEM 모델 설명
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    문서

    문서 없음

    HITACHI

    HL-7000M

    verified-listing-icon

    검증됨

    카테고리
    Lithography

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    115224


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography
    빈티지: 2002조건: 중고
    마지막 검증일60일 이상 전

    HITACHI

    HL-7000M

    verified-listing-icon
    검증됨
    카테고리
    Lithography
    마지막 검증일: 60일 이상 전
    listing-photo-abc5b9ae0acd44d9a2be3d4843d6062c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    115224


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    E-Beam Litho
    환경 설정
    6" RETICLE MASK LINE
    OEM 모델 설명
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    문서

    문서 없음

    유사 등재물
    모두 보기
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography빈티지: 2002조건: 중고마지막 검증일:60일 이상 전
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography빈티지: 0조건: 중고마지막 검증일:60일 이상 전