설명
Machines - Photo line Exposure Detailed structure of the unit & quantity Detailed Unit Description - PSX1/MSX1/MLX1/PLX1/IUX1 Equipment capabilities Equipment Capabilities - 1.Accuracy (linear correction): ±1.0µm 2. Min line W/S: 3.5µm 3. TP single-point accuracy: ±4µm환경 설정
환경 설정 없음OEM 모델 설명
Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line) Projection magnification: 1:1 Overlay: ≦ ±0.6 µm (3σ) Maximum plate size: 1,500 × 1,850 mm Takt time: 67 sec./plate Conditions: 4 scans, g+h+i-line, 30 mJ/cm2문서
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NIKON
FX-65S
카테고리
Lithography
마지막 검증일: 12일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
145509
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Machines - Photo line Exposure Detailed structure of the unit & quantity Detailed Unit Description - PSX1/MSX1/MLX1/PLX1/IUX1 Equipment capabilities Equipment Capabilities - 1.Accuracy (linear correction): ±1.0µm 2. Min line W/S: 3.5µm 3. TP single-point accuracy: ±4µm환경 설정
환경 설정 없음OEM 모델 설명
Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line) Projection magnification: 1:1 Overlay: ≦ ±0.6 µm (3σ) Maximum plate size: 1,500 × 1,850 mm Takt time: 67 sec./plate Conditions: 4 scans, g+h+i-line, 30 mJ/cm2문서
문서 없음