Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

FX-301D

FPD Steppers
Resolution: ≦ 3 µm (L/S)
Projection magnification: 1:1.25
Exposure field: 132 mm square
Overlay: ≦ 0.4 µm (3σ)
Maximum plate size: 730 × 920 mm
Reticle size: 6-in. (0.25-in. thickness)
Takt time:89 sec./plate (42 shots) (30 mJ/cm2)

FX-801M

Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ 0.6 µm
Maximum plate size: 1,300 × 1,300 mm
Takt time	67 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-53S

FX-6AS

Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm (3σ)
Maximum plate size: 1,500 × 1,850 mm
Takt time: 67 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-65S

Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm (3σ)
Maximum plate size: 1,300 × 1,300 mm
Takt time	59 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-55S

Resolution (L/S): 3.0 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm
Maximum plate size: 1,950 mm × 2,250 mm
Takt time: Takt time	56 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2


FX-76S

Resolution (L/S) (switchable): ≦ 3.5 µm (g+h+i-line), 3 µm (i-line) (option)
Projection magnification: 1:1
Overlay: ≦ 0.6 µm
Maximum plate size: 2,200 × 2,500 mm
Takt time: 75 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-81S

Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S)
Projection magnification: 1:1
Exposure field: 400 × 714 mm
Overlay: ≦ 0.6 µm (3σ)
Maximum plate size: 920 × 920 mm

FX-22S

FPD Steppers
Resolution: 2.4 µm (isolated pattern), 3 µm (L/S)
Projection magnification: 1:1.25
Exposure field: 132 mm square to 105.87 (H) × 153.75 (V) mm (≦ ø186.68 mm)
Reticle size: 6-in. (0.25-in. thickness)
Maximum plate size: 600 (X) × 720 (Y) mm
Overlay: 0.5 µm (|M| + 3σ, EGA)
Options: Pellicle particle detector, extended reticle library, six-reticle multichanger, bar-code reader, plate edge exposure function, etc.

FX-701M

FX-103SH

FX-402E

Resolution (L/S) (switchable): 3.5 µm (g+h+i-line), 3 µm (i-line) (option)
Projection magnification: 1:1
Overlay: ≦ 0.6 µm
Maximum plate size: 2,200 × 2,500 mm
Takt time: 72 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-73S

Resolution (L/S) (switchable): ≦ 3 µm (i-line), ≦ 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ 0.6 µm
Maximum plate size: 1,500 × 1,850 mm
Takt time: 73 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-63S

FPD Steppers
Resolution (L/S): 3.0 μm
Exposure field: 132 mm square
Exposure wavelength: g+h-line
Projection magnification: 1:1.25
Overlay: ≦ ±0.38 μm (3σ)
Maximum plate size: 730 × 920 mm
Reticle size: 6-in (0.25-in. thickness)
Takt time: (30 shots) 65 seconds (40 mJ/cm2)

FX-803M

FX-88S

FX-86SH2

Resolution (L/S): 3.0 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm
Maximum plate size: 2,200 mm × 2,500 mm
Takt time: 58 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-86S

FX-66S

FX-83S

FX-67S

FPD Steppers
Resolution (L/S): 1.5 μm
Exposure field: 132 mm square
Exposure wavelength: i-line (365 nm wavelength)
Projection magnification: 1:1.25
Overlay: ≦ ±0.30 μm (3σ)
Maximum plate size: 730 × 920 mm
Reticle size: 6-in. (0.25-in. thickness)
Takt time: (30 shots) 65 seconds (50 mJ/cm2)

FX-903N

Resolution (L/S) (switchable): ≦ 3.5 µm (g+h+i-line), 3 µm (i-line) (option)
Projection magnification: 1:1
Overlay: ≦ 0.6 µm
Maximum plate size: 1,950 × 2,250 mm
Takt time: 74 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-71S

FX-51S

FPD Scanners
Resolution (L/S) (switchable): 3.5 µm (g+h+i-line), 3.0 µm (i-line) (option)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm
Plate size: 2,880 mm × 3,130 mm
Takt time: 70 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-101S

FX-68S

FX-61S

FX-67S2

FX-201B

Resolution (L/S): 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm
Maximum plate size: 1,950 mm × 2,250 mm
Takt time: 58 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-75S

FX-68SH

Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S)
Projection magnification: 1:1
Exposure field: 400 × 700 mm
Overlay: ≦ 0.6 µm (3σ)
Maximum plate size: 800 × 950 mm

FX-21S

FX-66S2

FX-401E

FPD Steppers
Resolution: ≦ 1.5 µm (L/S), ≦ 2.0 µm (C/H)
Projection magnification: 1:1
Exposure field: 100 mm square to 74.83 x 120 mm (≦ ø141.42 mm)
Reticle size: 6-in. (0.25-in. thickness)
Maximum plate size: 600 (X) × 720 (Y) mm
Overlay: ≦ 0.32 µm (8-point + EGA, |M| + 3σ)
Options: Pellicle particle detector, extended reticle library, reticle bar code reader, remote control system (RCS)

FX-702J

Resolution (L/S): 3.5 µm (g+h+i-line)
Projection magnification: 1:1
Overlay: ≦ ±0.6 µm
Maximum plate size: 2,200 mm × 2,500 mm
Takt time: 60 sec./plate
Conditions: 4 scans, g+h+i-line, 30 mJ/cm2

FX-85S

FX-103S

Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S)
Projection magnification: 1:1.25
Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm)
Reticle size: 6-in. (0.25-in. thickness)
Maximum plate size: 550 × 650 mm
Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

NIKON

개요

활성 등재물

총 제품 수

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상위 NIKON Lithography

FX-801M

FX-53S

FX-6AS

FX-51S

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