설명
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller환경 설정
환경 설정 없음OEM 모델 설명
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.문서
문서 없음
RAITH
150 TWO
카테고리
Lithography
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
135810
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller환경 설정
환경 설정 없음OEM 모델 설명
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.문서
문서 없음