설명
Electron-beam lithography system환경 설정
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 모델 설명
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.문서
문서 없음
RAITH
e-LiNE
카테고리
Lithography
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
153432
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Electron-beam lithography system환경 설정
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 모델 설명
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.문서
문서 없음