설명
PC - Serial Board for four RS-232 Ports - Camera Cables (length: 1.5m each) - Cognex MVS8100 Frame Grabber Card - Camera Breakout Cable for MVS Frame Grabber Card - EPROM - Windows 2000 - Back-up hard drive will be made on site for customer to keep - This PC will match the existing configuration of your EVG 620 - Condition: new환경 설정
환경 설정 없음OEM 모델 설명
The EVG6200∞ Alignment System is a high-throughput, reliable, and accurate system for handling wafers and substrates up to 200mm. It features EV Group’s NanoAlign Technology for high alignment accuracy and resolution, making it competitive in full-field lithography. It is designed for wafer bumping, chip scale packaging, MEMS, Compound Semiconductor, Power Devices, and Nanotechnology applications. The system has a high degree of automation and can handle multiple wafer sizes with quick change-over time. It also has options for cassette-to-cassette handling, automatic alignment, and field upgrades.문서
문서 없음
EVGroup (EVG)
EVG6200-Infinity
검증됨
카테고리
Mask/Bond Aligners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
76556
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
EVGroup (EVG)
EVG6200-Infinity
카테고리
Mask/Bond Aligners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
76556
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
PC - Serial Board for four RS-232 Ports - Camera Cables (length: 1.5m each) - Cognex MVS8100 Frame Grabber Card - Camera Breakout Cable for MVS Frame Grabber Card - EPROM - Windows 2000 - Back-up hard drive will be made on site for customer to keep - This PC will match the existing configuration of your EVG 620 - Condition: new환경 설정
환경 설정 없음OEM 모델 설명
The EVG6200∞ Alignment System is a high-throughput, reliable, and accurate system for handling wafers and substrates up to 200mm. It features EV Group’s NanoAlign Technology for high alignment accuracy and resolution, making it competitive in full-field lithography. It is designed for wafer bumping, chip scale packaging, MEMS, Compound Semiconductor, Power Devices, and Nanotechnology applications. The system has a high degree of automation and can handle multiple wafer sizes with quick change-over time. It also has options for cassette-to-cassette handling, automatic alignment, and field upgrades.문서
문서 없음