설명
MEDIUM CURRENT ION IMPLANTER환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음
카테고리
Medium Current
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
148252
웨이퍼 사이즈:
8"/200mm
빈티지:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
카테고리
Medium Current
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
148252
웨이퍼 사이즈:
8"/200mm
빈티지:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
MEDIUM CURRENT ION IMPLANTER환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음