설명
High Current Implanter 1 Chamber Damage/Missing parts list: Pumps, chillers, and support items may not be included, please inspect the tool to confirm.환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음
카테고리
Medium Current
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147596
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
카테고리
Medium Current
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
147596
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
High Current Implanter 1 Chamber Damage/Missing parts list: Pumps, chillers, and support items may not be included, please inspect the tool to confirm.환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음