설명
No missing parts환경 설정
AMEC PD5 MoCVD Process Application : GaN Power Epitaxy Wafer Type : 11x4”, 6x6”, 3x8” GaN on Silicon/SiC Transfer Module : Yes, able to support up to 4 chambers Pump : Edwards iXH645H Chiller : SMC MFCs Type : Horiba MO Configuration : TMGa1/2, TMAl1/2, TEGa, Cp2Fe, TMIn, Cp2Mg Doping Source : 2x External Dopant inlet Inline Purifiers : H2, N2, NH3 Dew Point Sensor : H2, N2OEM 모델 설명
MOCVD system for production of GaN power devices문서
문서 없음
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (AMEC)
Prismo PD5
검증됨
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
97816
웨이퍼 사이즈:
알 수 없음
빈티지:
2020
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (AMEC)
Prismo PD5
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
97816
웨이퍼 사이즈:
알 수 없음
빈티지:
2020
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
No missing parts환경 설정
AMEC PD5 MoCVD Process Application : GaN Power Epitaxy Wafer Type : 11x4”, 6x6”, 3x8” GaN on Silicon/SiC Transfer Module : Yes, able to support up to 4 chambers Pump : Edwards iXH645H Chiller : SMC MFCs Type : Horiba MO Configuration : TMGa1/2, TMAl1/2, TEGa, Cp2Fe, TMIn, Cp2Mg Doping Source : 2x External Dopant inlet Inline Purifiers : H2, N2, NH3 Dew Point Sensor : H2, N2OEM 모델 설명
MOCVD system for production of GaN power devices문서
문서 없음