설명
Molecular Vapor Deposition환경 설정
Vapor-Phase Monolayer Vapor Deposition System System Configuration as follows: Manual Loading / up to an 8" round substrate x 1.2" deep. (9.5" x 9.5" x 1") Typical Capacity: Can accommodate die or special devices through manual loading Chamber is 4",6",8" capatible Up to three (3) 8" wafers with a special holder Up to three (3) 6" wafers with a special holder Temperature Controlled Aluminum Chamber - Programmable by Software Roughing Valve with Slow Pumping Port Chamber Baratron Capacitance Manometer Pressure Gauge (Heated) (0-10torr) Fully Integrated Inductively Coupled Downstream Plasma Source for surface modification and cleaning Includes Gate Valve Isolation of Plasma Source Electronic Mass Flow Controller for Plasma Source gas control - Oxygen 13.56MHz Dressler RF Generator (300Watts) 3 Vapor Delivery Lines includes three (3) Temperature Controlled Vapor Delivery lines includes three (3) Capacitance Manometer Pressure Gauge includes three (3) Vapor Expansion Volumes tuned for MVD-100 configuration includes three (3) 50cc SS-316 Vials with Manual Vacuum Valves Software: Touch-Screen Control System - Fully Automatic Process Sequencing Vacuum Pump Interface (The Buyer supplies a dry pump) - 40M3H or greater pump recommended for most applications. Emergency Power-off (EMO) Switch Vented Gas CabinetOEM 모델 설명
Molecular Vapor Deposition System문서
문서 없음
SPTS / APPLIED MICROSTRUCTURES
MVD 100
검증됨
카테고리
MVD
마지막 검증일: 5일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75914
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SPTS / APPLIED MICROSTRUCTURES
MVD 100
카테고리
MVD
마지막 검증일: 5일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
75914
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Molecular Vapor Deposition환경 설정
Vapor-Phase Monolayer Vapor Deposition System System Configuration as follows: Manual Loading / up to an 8" round substrate x 1.2" deep. (9.5" x 9.5" x 1") Typical Capacity: Can accommodate die or special devices through manual loading Chamber is 4",6",8" capatible Up to three (3) 8" wafers with a special holder Up to three (3) 6" wafers with a special holder Temperature Controlled Aluminum Chamber - Programmable by Software Roughing Valve with Slow Pumping Port Chamber Baratron Capacitance Manometer Pressure Gauge (Heated) (0-10torr) Fully Integrated Inductively Coupled Downstream Plasma Source for surface modification and cleaning Includes Gate Valve Isolation of Plasma Source Electronic Mass Flow Controller for Plasma Source gas control - Oxygen 13.56MHz Dressler RF Generator (300Watts) 3 Vapor Delivery Lines includes three (3) Temperature Controlled Vapor Delivery lines includes three (3) Capacitance Manometer Pressure Gauge includes three (3) Vapor Expansion Volumes tuned for MVD-100 configuration includes three (3) 50cc SS-316 Vials with Manual Vacuum Valves Software: Touch-Screen Control System - Fully Automatic Process Sequencing Vacuum Pump Interface (The Buyer supplies a dry pump) - 40M3H or greater pump recommended for most applications. Emergency Power-off (EMO) Switch Vented Gas CabinetOEM 모델 설명
Molecular Vapor Deposition System문서
문서 없음