설명
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”환경 설정
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 모델 설명
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers문서
문서 없음
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
113547
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
113547
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”환경 설정
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 모델 설명
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers문서
문서 없음