설명
Ultratech Stepper, Model Spectrum 3e - Universal Chuck for 4",5", 6" & 8" wafers - 2um resolution - 1200W illuminator(GHI) - Patmax system - Genmark robotic wafer handler - 12 slot reticle library - 44x26.7 light pipe - Filter changer환경 설정
환경 설정 없음OEM 모델 설명
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.문서
문서 없음
VEECO / ULTRATECH
SATURN SPECTRUM 3e
검증됨
카테고리
Photolithography
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50216
웨이퍼 사이즈:
알 수 없음
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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모두 보기
VEECO / ULTRATECH
SATURN SPECTRUM 3e
검증됨
카테고리
Photolithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50216
웨이퍼 사이즈:
알 수 없음
빈티지:
2005
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Ultratech Stepper, Model Spectrum 3e - Universal Chuck for 4",5", 6" & 8" wafers - 2um resolution - 1200W illuminator(GHI) - Patmax system - Genmark robotic wafer handler - 12 slot reticle library - 44x26.7 light pipe - Filter changer환경 설정
환경 설정 없음OEM 모델 설명
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.문서
문서 없음