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ExposureOEM 모델 설명
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
64159
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
VEECO / ULTRATECH
SATURN SPECTRUM 3e
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
64159
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
ExposureOEM 모델 설명
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.문서
문서 없음