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설명 없음환경 설정
Main Process- SLAB PVD configOEM 모델 설명
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.문서
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APPLIED MATERIALS (AMAT)
ENDURA 5500
검증됨
카테고리
PVD / Sputtering
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
116499
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
ENDURA 5500
카테고리
PVD / Sputtering
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
116499
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Main Process- SLAB PVD configOEM 모델 설명
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.문서
문서 없음