설명
Reticle Inspection환경 설정
환경 설정 없음OEM 모델 설명
KLA-Tencor Corp. has introduced two new enhancements for reticle and photomask inspection: the Advanced Performance Algorithm (APA) and the STARlight High Resolution (HR) option. These enhancements enable accurate and reliable inspection of next-generation 0.25-m reticles, including those with complex optical proximity correction (OPC) geometries. APA is a new feature for the RAPID 300 Series reticle pattern inspection systems, while HR is a new option for the STARlight reticle contamination inspection systems. The STARlight HR option uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production. STARlight HR is available on all SL300, SL301, and SL351 systems as a factory or field upgrade option.문서
문서 없음
KLA
SL300
카테고리
Reticle / Mask Inspection
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
135550
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Reticle Inspection환경 설정
환경 설정 없음OEM 모델 설명
KLA-Tencor Corp. has introduced two new enhancements for reticle and photomask inspection: the Advanced Performance Algorithm (APA) and the STARlight High Resolution (HR) option. These enhancements enable accurate and reliable inspection of next-generation 0.25-m reticles, including those with complex optical proximity correction (OPC) geometries. APA is a new feature for the RAPID 300 Series reticle pattern inspection systems, while HR is a new option for the STARlight reticle contamination inspection systems. The STARlight HR option uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production. STARlight HR is available on all SL300, SL301, and SL351 systems as a factory or field upgrade option.문서
문서 없음