설명
12-inch wafer rapid thermal processing equipment환경 설정
12-inch wafer rapid thermal processing equipmentOEM 모델 설명
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.문서
문서 없음
MATTSON / STEAG / AST
3000
검증됨
카테고리
RTP/RTA
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
91038
웨이퍼 사이즈:
12"/300mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
MATTSON / STEAG / AST
3000
카테고리
RTP/RTA
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
91038
웨이퍼 사이즈:
12"/300mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
12-inch wafer rapid thermal processing equipment환경 설정
12-inch wafer rapid thermal processing equipmentOEM 모델 설명
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.문서
문서 없음