Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

The HD-2700 is an 80-200 kV field-emission-gun scanning transmission electron microscope (STEM) with secondary electron (SE) imaging capability. Bulk and surface structures of a specimen can be imaged simultaneously. With the option for a probe-forming aberration corrector, ultra-high resolution can be achieved for both STEM and SE imaging. The Hitachi corrector minimizes the user's effort in doing aberration correction. Large solid-angle EDS* and atomic-spatial-resolution EDS* and EELS spectrum imaging* are enabled.

HITACHI

HD-2700

SU3900SE

HITACHI S 9200S is SEM & TEM system. The HITACHI 9200S can be used with 8” wafer size. It was equipped for CD Scanning electron microscope (SEM) with 8” system size. Its comes with open cassette display monitor system with UPS power rack. Its required power supply for 3 phase is 230VAC (6Kva) with 50Hz frequency. Its range of measurement wavelength  is 1um to 2.0um.  

S-9200S

S-2600N

-SU8700: The SU8700 brings in a new era of ultrahigh-resolution Schottky field emission scanning electron microscopes to the long-standing Hitachi EM line-up. This revolutionary FE-SEM platform incorporates multifaceted imaging, high-probe current, automation, efficient workflows for users of all experience levels, and more.

SU8700

FE-SEM
The new SU8000 features a top detector along with a semi-in-lens type of objective lens. This technology is a further advance on the popular upper backscattered electron detector used in the S-5500. By combining the top detector with the conventional upper detector technology, Hitachi has now developed a new signal detection system for optimum contrast visualization of signals, generated from the sample. These signals include secondary electrons, low-angle backscattered electrons and high-angle backscattered electrons, which are acquired for observation of surface structures.

SU8000

SU3900SE Plus

The S-4300SE allows a probe current of 25 nA (maximum) at 20 kV. It is useful for analytical and other applications that require a large probe current. 

S-4300SE

The modern FE-SEM requires not only high performance but also a multitude of functionalities including wide-area observation, in-situ analysis, variable pressure, high-resolution imaging at low accelerating voltages, and simultaneous multi-signal collection.

The SU7000 is designed to address these aspects and more by delivering enhanced information for diversified needs in the field of electron microscopy.

SU7000

S-800

The FlexSEM 1000 II VP-SEM combines innovative technological features with an intuitive interface, to deliver adaptability and flexibility in a powerful, automated, lab-friendly package. Cutting-edge technology and circuitry provides unrivaled imaging performance, even in variable-pressure environments, a feature previously only available in a full-sized SEM. This SEM runs on clean energy for an economical analytical tool, without compromising performance.

FlexSEM 1000 II

S-4200

S-4500 II

S-2700

I 5320

6410

As a new brand of FE-SEMs, the Regulus series lineup comprises four models: the Regulus8100, Regulus8220, Regulus8230, and Regulus8240, all of which extend the functions of the SU8200 series with the use of a common platform.

With optimized electron optical systems, the new Regulus series features resolutions down to 0.7 nm in the Regulus8220/8230/8240 models and 0.8 nm in the Regulus8100 model.

The Regulus series employs a novel cold-field-emission (CFE) gun optimized for high-resolution imaging at low accelerating voltages. This CFE gun makes it possible to magnify high-resolution images up to 2 million times,*1 compared with 1 million times in previous models.

User-support functions have also been enhanced so that the advanced performance of the series can be fully leveraged, including functions to assist the operation of the signal detection system for analyzing diverse types of materials, as well as device-maintenance functions.

REGULUS8220

The 3D SEM*1 CT1000 enables 3D observation of pattern and defects shapes that occur during the manufacturing process on wafers up to 8 inches (200 mm) in diameter, with a feature to analyze the elemental composition of objects being observed. This product will help to contribute to the quality assurance on IoT (Internet of Things) and in-vehicle automotive semiconductor devices.

CT1000

The FlexSEM 1000 is a compact variable-pressure SEM that delivers the performance of a conventional SEM in a lab-friendly footprint, and requires only a standard wall outlet for power.
The FlexSEM will change your view of electron microscopy!

FlexSEM 1000

Hitachi High-Tech Corporation has developed the Ethos NX5000 high-performance FIB(*1)-SEM(*2), which combines a high-intensity cold-cathode field emission electron gun technology with a newly developed magnetic/electrostatic compound lens (or dual-mode lens).

The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.

NX5000

The Model RS-4500 is an enhanced tool based on the RS-4000, with the added function of intelligent automatic review point sampling for better review efficiency. When handling a vast amount of defect review data, the RS-4500 provides equivalent review efficiency to all defect sampling by sampling fewer defects.

RS-4500

Large chamber/large stage model for large or multiple samples.

SU8030

Same high performance optics as S-3400N 
Variable Pressure mode as standard
Large samples up to 153mm in diameter (observation range 126mm in diameter)
Observation and EDS analysis on a sample up to 60mm tall
Main unit is only 55 cm wide, operating table can be provided by user. 
TMP vacuum is standard
Resolution: 3.0 nm（30kV,SE,HV), 4.0 nm(30kV,BSE,LV)

SU1510

the advanced technologies incorporated into the SU-1500 provide a guaranteed secondary electron resolution of 3.0nm (high vacuum mode) and a guaranteed backscattered electron resolution of 4.0nm (variable pressure mode).

SU1500

The SU8200 opens a new gateway for SEM analysis. The ultimate SEM electron source now offers high signal to noise )S/N0 and uncompromising resolutions with beam current and stability, which is critical for analytical solutions. The robust SU8200 series supports a wide variety of applications within material research ‘ development and industrial quality control environments 

SU8220

is the top-of-the-line SEM equipped with cold FE electron source and in-lens objective lens with least aberration, and achieves the world's highest SE resolution of 0.4nm. In addition to high resolution STEM with 0.34nm resolution, EELS and diffraction that are usually considered difficult for SEM can also be supported.

The SU9000 is HITACHI's new premium SEM. It features unique electron optics, with the sample positioned inside a gap between the upper and lower parts of the objective lens pole piece. This so-called true in-lens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible system resolution (SE resolution 0.4 nm @ 30 kV, 1.2 nm @ 1 kV without requiring beam deceleration technology [0.8nm with beam deceleration]) and stability.

SU9000

Hitachi High-Technologies Corporation has developed the SU6600 Schottky Field Emission Analytical SEM to meet the increased demand for analytical, high resolution microscopy. It utilizes advanced Variable Pressure (VP) technology and an improved Schottky field emission electron source that provides exceptional imaging and high probe current with great stability. It allows accommodation of EDX, WDX and EBSP' systems for versatile material analyses in addition to high resolution imaging and materials characterization. The SU6600 provides unparalleled imag­ing and EDX and EBSP analysis of challenging samples without the need for sample preparations such as metal coating or special grounding techniques. 

SU6600

The newly developed FIB-SEM system from Hitachi, the NX9000 incorporates an optimized layout for true high-resolution serial sectioning to tackle the latest demands in 3D structural analysis and for TEM and 3DAP analyses. The NX9000 FIB-SEM system allows the highest precision in material processing for a wide range of areas relating to advanced materials, electronic devices, biological tissues, and a multitude of other applications.

NX9000

The SU5000 FE-SEM has forever changed SEM operations. Ground-breaking computer-assisted technology from Hitachi, referred to as the EM Wizard, offers a new level of SEM operation and control. Expert or novice, the result is now the same: Highest quality nano-scale images at everyone's fingertips!

SU5000

The CR7300 is a state-of-the-art review SEM (Scanning Electron Microscope) designed to enhance productivity in the manufacturing of advanced semiconductor devices. It boasts improved electron optics that deliver the highest resolution images yet, providing detailed insights into the semiconductor manufacturing process. Furthermore, its sophisticated imaging and stage systems facilitate rapid image acquisition, reducing inspection time by half compared to traditional methods. This significant speed increase contributes to overall efficiency in semiconductor production.

CR7300

S-3400

The SU8600 brings in a new era of ultrahigh-resolution cold-field emission scanning electron microscopes to the long-standing Hitachi EM lineup. This revolutionary CFE-SEM platform incorporates multifaceted imaging, automation, increased system stability, efficient workflows for users of all experience levels, and more.

SU8600

S-570

The ultimate SEM electron source now offers high signal to noise )S/N0 and uncompromising resolutions with beam current and stability, which is critical for analytical solutions. The robust SU8200 series supports a wide variety of applications within material research ‘ development and industrial quality control environments 

SU8240

S-6780

Lower/Upper/Top (Triple) SE detectors to extend the capability to collect secondary electrons and low energy backscattered electrons This novel, ultrasensitive detection system allows high efficiency, simultaneous multi-signal imaging and energy filtering.

SU8020

Visual inspection system I-6300, a high-sensitivity high-speed tool for application to 45-nm node and beyond next-generation semiconductor device fabrication. 

I-6300

S-3200N

S-3400N II

SU8230

S-2460N

S-3600N

RS 3000T

S-520

Performance & Power in a Flexible Platform
Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance. The SU3900 is equipped with a large multipurpose specimen chamber to accommodate observation of large samples.

SU3800

Performance & Power in a Flexible Platform
Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance. The SU3900 is equipped with a large multipurpose specimen chamber to accommodate observation of large samples.



SU3900

REGULUS8240

High-Speed Defect Review SEM
Wafer size: Φ300mm (SEMI standard V notched wafer)

CR6300

REGULUS8100

REGULUS8230

S-5000

The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.

S-4700 I

The S-5500, Immersion Lens system which generates the highest resolution images in the world(*1)(0.4nm at 30kV. The S-5500 have improved performance over that of its predecessor, the S-5200. [Main features of S-5500] (1) The world’s highest resolution, 0.4 nm at 30 kV, achieved by the use of a new electron optics system (as of October 2004). (2) New BF (bright field)/ DF (dark field) Duo STEM (scanning transmission electron microscopy) detector allows simultaneous display of BF and DF STEM images. In DF STEM mode, this detector is capable of providing images with variable detection angles. This new detection system greatly extends the usage of low accelerating voltage STEM at 30 kV.

S-5500

The S-4500 with a semi-in-lens type objective lens and cold field emission electron source suited to high resolution microscopy that was well received in the market. 

S-4500

The S-4800 is an advanced Field Emission Scanning Electron Microscope (FE-SEM) that builds upon the proven performance of its predecessors, the S-4700 and S-5200. With beam deceleration technology, it achieves an impressive resolution of 1.4 nm at 1 kV and 1.0 nm at 15 kV. The microscope features a semi-in-lens detector design, allowing for the examination of large samples without compromising ultra-high resolution at low accelerating voltages. The innovative objective lens design incorporates Hitachi's Super ExB filter technology, which effectively separates pure secondary electrons (SE), compositional SE, and backscattered electron (BSE) signals. With a specimen diameter of 200 mm and a 5-axis motorized eucentric stage, it offers exceptional sample accommodation and positioning capabilities. The S-4800 is compatible with optional accessories such as Energy Dispersive X-ray Spectrometer (EDX) and Electron Backscatterted Diffraction Pattern (EBDP) systems, making it suitable for a range of ultra-high resolution applications in fields like semiconductor research, materials studies, and nanotechnology.

S-4800

S-5200

Field Emission Scanning Electron Microscope

S-4800 II

S-3400N

HITACHI S 4700 II is a SEM & TEM system. The S 4700 II has standard secondary electron detector (SE), a backscatter electron detector (BSD) and a Gatan MonoCL cathodoluminescence detector (CL). The BSD is sensitive to slight energy variations occurring when a high energy electron scatters off the nucleus of an atom. This sensitivity allows the BSD to map out variations in the densities of the sample. The CL measures photons released by the sample as it interacts with the electron beam and uses the information gathered from these photons to conduct elemental analysis.

S-4700 II

S-3000N

S-4160

The RS-4000 performs at a high throughput of 1,200 DPH (defects per hour), which is about 3 times faster than the conventional model, and performs defect review at a high speed and high defect capture rate thereby improving image resolution (3 nm) and enhancing image processing. Combined with ADC (automatic defect classification) to identify killer defects, the tool produces data directly linked with yield enhancement in a short time. Furthermore, the newly added function of tilt image observation by tilting the electron beam enables the tool to generate more defect information.

RS-4000

S-4000

S-3700N is designed as a new series of Tungsten-type VP-SEM to accommodate sample diameters up to 300mm using a new large specimen chamber and a large specimen stage. Moreover, simultaneous accommodations of accessory attachments for EDX, WDX and EBSP (*1) analyses are possible at optimized analytical geometry. The specimen stage has a wide traverse range for observation of sample areas up to 203mm diameter and up to 110mm height with EDX and WDX analysis.

S-3700N

RS-6000

RS 5500

200 kV dedicated STEM for semiconducting industry, materials science and biological science.

HD-2300

The RS-3000 is a high-speed review tool that achieves a defect review speed of 600 DPH (defects per hour) with teaching-free automatic defect classification capability.

RS-3000

S-4100

S-3000H

The HD-2000 offers high resolution of 0.24 nm and a maximum magnification of 2 million times, yet offers the simplicity of operation of an SEM.

HD-2000

The S-3500N has all the standard features of the S-3000N, but benefits from a chamber that can accept samples up to 8" in diameter, which also allows both EDX and WDX spectrometers to be fitted simultaneously. The EDX spectrometer can be fully integrated with Hi-Mouse option, which allows a single mouse and keyboard operate both the SEM and EDX system. The S-3500N has a high density frame memory of up to 2560 x 1920 pixels and an integral image processing, management and archiving system.

S-3500N

S-7000

S-2500

NB5000

S-2600H

the SU8040 that features a newly developed Regulus Stage. The Regulus stage has the capability that can be operated smoothly even at ultra high resolution. The Regulus stage has adopted a high reliable conventional motor drive, but the capability has been greatly improved thanks to the newly developed motor drivetrain. Now the Regulus stage can achieve seamless stage operation and high throughput observation without any stress.

SU8040

I-5320N

HD-2300A

S-806

FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies.
Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications.
* Option

NX2000

S-2300

S-530

Analytical UHR Schottky Emission Scanning Electron Microscope
Model SU-70 is a new-concept SEM, incorporating Hitachi’s field proven semi-in-lens technology for ultra-high resolution with a Schottky electron gun. It features not only ultra-high resolution (1.0nm/15kV, 1.6nm/Kv (*)) but also reduced charge-up imaging, compositional-contrast imaging, and ultra-low voltage imaging derived from Hitachi’s highly reputed Super ExB filter technology. The Schottky electron gun enables a wide variety of analytical capabilities due to its high probe current (100nA). 

SU-70

S-3200H

SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments. 

SU3500

RS-5000

S-5000H

SU8200

S-6600

Entry level model with Lower in-chamber/Upper in-lens (Dual) SE detectors.

SU8010

The Hitachi S-4300 E/N (FESEM), with guaranteed 1.5 nm resolution at 15 kV (5.0 nm at 1.0 kV), combines both high resolution and variable pressure into a single instrument.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

HITACHI

개요

활성 등재물

총 제품 수

서비스

상위 HITACHI SEM / FIB

SU3900SE

HD-2700

SU3800

SU3900

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모든 HITACHI SEM / FIB