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ASML PAS 5500/1100B
    설명
    Function: Exposure machine Structure: Modular CD 0.11
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.
    문서

    문서 없음

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    검증됨

    카테고리
    Steppers & Scanners

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    123817


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    ASML PAS 5500/1100B

    ASML

    PAS 5500/1100B

    Steppers & Scanners
    빈티지: 2001조건: 중고
    마지막 검증일60일 이상 전

    ASML

    PAS 5500/1100B

    verified-listing-icon
    검증됨
    카테고리
    Steppers & Scanners
    마지막 검증일: 60일 이상 전
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/c89aa81f3fed4d84b145f2340c3dfa79_3_mw.jpg
    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/f49b103f5654407eb69135a224257a45_1_mw.jpg
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    listing-photo-ad602617d42447b59a65ad0ceaace0f8-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/ad602617d42447b59a65ad0ceaace0f8/cf5955722493439ebf0e20d86f799f27_4_mw.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    123817


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2001


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Function: Exposure machine Structure: Modular CD 0.11
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.
    문서

    문서 없음

    유사 등재물
    모두 보기
    ASML PAS 5500/1100B

    ASML

    PAS 5500/1100B

    Steppers & Scanners빈티지: 2001조건: 중고마지막 검증일:60일 이상 전