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ASML PAS 5500/400C

설명

PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -

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환경 설정 없음

OEM 모델 설명

The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.

문서

문서 없음

ASML

PAS 5500/400C

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검증됨

카테고리

Steppers & Scanners

마지막 검증일: 12일 전

주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

149295

웨이퍼 사이즈:

알 수 없음

빈티지:

알 수 없음

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

유사 등재물

ASML PAS 5500/400C

ASML

PAS 5500/400C

Steppers & Scanners

빈티지: 0조건: 중고

마지막 검증일12일 전

ASML

PAS 5500/400C

verified-listing-icon

검증됨

카테고리

Steppers & Scanners

마지막 검증일: 12일 전

listing-photo-0809f17948d04dc08979d9c0b12e896a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

149295

웨이퍼 사이즈:

알 수 없음

빈티지:

알 수 없음

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

설명

PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -

환경 설정

환경 설정 없음

OEM 모델 설명

The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.

문서

문서 없음

유사 등재물

ASML PAS 5500/400C

ASML

PAS 5500/400C

Steppers & Scanners빈티지: 0조건: 중고마지막 검증일:12일 전