설명
Lithography환경 설정
환경 설정 없음OEM 모델 설명
"The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. The stepper uses 5X reduction imaging allowing a maximum die area of 18mm by 22.4mm per exposure. The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500 platform marks a great step forward from the PAS 2500/5000 in terms of imaging and throughput capabilities The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.문서
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ASML
PAS 5500/60
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
63323
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/60
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
63323
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Lithography환경 설정
환경 설정 없음OEM 모델 설명
"The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. The stepper uses 5X reduction imaging allowing a maximum die area of 18mm by 22.4mm per exposure. The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500 platform marks a great step forward from the PAS 2500/5000 in terms of imaging and throughput capabilities The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.문서
문서 없음