설명
Function: Exposure machine Structure: Modular CD 0.2환경 설정
환경 설정 없음OEM 모델 설명
The PAS 5500/750E DUV Step & Scan system enables 130nm mass production using mature 248nm KrF technology. This is made possible by advancements in all major subsystems of the PAS 5500 system, resulting in the required imaging and overlay performance. The PAS 5500/750E combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest innovations in the AERIAL II™ illumination technology, including QUASAR™ multipole illumination and optional multiple exposure capability. The system is equipped with the proven TTL alignment system as well as with ATHENA ™ for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 30nm. A 2kHz 20W KrF laser with Variable Laser Frequency Control in combination with the high speed scanning stages and the high optical transmission of the complete system provide a production throughput of 120 200mm wph with the lowest possible laser Cost of Operation.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
123818
웨이퍼 사이즈:
알 수 없음
빈티지:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/750E
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
123818
웨이퍼 사이즈:
알 수 없음
빈티지:
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Function: Exposure machine Structure: Modular CD 0.2환경 설정
환경 설정 없음OEM 모델 설명
The PAS 5500/750E DUV Step & Scan system enables 130nm mass production using mature 248nm KrF technology. This is made possible by advancements in all major subsystems of the PAS 5500 system, resulting in the required imaging and overlay performance. The PAS 5500/750E combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest innovations in the AERIAL II™ illumination technology, including QUASAR™ multipole illumination and optional multiple exposure capability. The system is equipped with the proven TTL alignment system as well as with ATHENA ™ for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 30nm. A 2kHz 20W KrF laser with Variable Laser Frequency Control in combination with the high speed scanning stages and the high optical transmission of the complete system provide a production throughput of 120 200mm wph with the lowest possible laser Cost of Operation.문서
문서 없음